Specs at a glance
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Measuring range
ORP: –1 500 to 1 500 mV
Application B
• pH: 0 to 14
Application H
• pH: 0 to 12 -
Process temperature
Application B and H:
0 to 140 ° C (32 to 284 ° F)
Version TB:
0 to 140 ° C (32 to 284 ° F)
Version TU, TP (pressurized reference):
0 to 140 ° C (32 to 284 ° F) (140 ° C (284 ° F) for sterilization only)
maximum 100 ° C (212 ° F) in continuous operation due to increasing
pressure drop at T> 100 ° C (212 ° F) -
Process pressure
Application B: 0.8 to 14 bar (11.6 to 203 psi) absolute
Application H: 0.8 to 7 bar (11.6 to 101,5 psi) absolute
Field of application
Memosens CPS76E is the heavy-duty specialist for simultaneous pH and ORP measurement. Its unique, contamination-resistant reference guarantees stable measurement in polluted, poisoning media and in media with low conductivity. Thanks to Memosens 2.0 digital technology, CPS76E combines maximum process integrity with simple operation. It resists moisture, enables lab calibration and offers extended storage of calibration and process data providing the perfect basis for predictive maintenance.
Processes in chemical industry and monitoring of processes with:
Quickly changing pH or ORP values
High proportion of electrode poisons such as H2S
With ATEX, IECEx, CSA C/US, NEPSI, Japan, INMETRO approvals for use in hazardous areas, zones 0, 1 and 2.
Benefits
Memosens 2.0 offers extended storage of calibration and process data, enabling better trend identification and providing a future-proof basis for predictive maintenance and enhanced IIoT services.
Simultaneous measurement of pH, ORP and rH values (in rH mode) provides a better process overview and allows for a tighter process control.
Its optional pressurized reference ensures reliable measurement in blocking media, such as dispersions.
Unique ion trap prevents poisoning of the electrode's junction and reference ensuring a long sensor lifetime.
Flexible installation thanks to optional upside-down mounting.
Maximum process safety through non-contact, inductive signal transmission.
Reduced operating costs thanks to minimized process downtime and extended sensor lifetime.
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